NickelMaghrebV1, Main, Exploration, bibRecord, 000F77

Structural behavior of direct-current sputtered and thermally evaporated molybdenum thin films

Identifieur interne : 000F77 ( Main/Exploration ); précédent : 000F76; suivant : 000F78

Structural behavior of direct-current sputtered and thermally evaporated molybdenum thin films

Auteurs : S. Kacim [Maroc] ; P. Delcambe [Belgique] ; L. Binst [Belgique] ; M. Jardinier-Offergeld [Belgique] ; F. Bouillon [Belgique]

Source :

Thin Solid Films [ 0040-6090 ] ; 1994.

RBID : ISTEX:6D67AD939751EEA4BCB7746B81FADA105B506C66

Abstract

Mo films were deposited on sintered polycrystalline MgO. These films exhibited, depending on deposition conditions, two different structures, namely the normal body-centered cubic and an abnormal face-centered cubic. The analysis performed by electron diffraction and Auger electron spectroscopy indicated that the fcc structure assumed by molybdenum is an impurity-stabilized phase rather than a simple polymorphic transformation or dimolybdenum nitride (γMo2N) as previously stated by some authors.

Url:

https://api.istex.fr/document/6D67AD939751EEA4BCB7746B81FADA105B506C66/fulltext/pdf

DOI: 10.1016/0040-6090(94)90753-6

Affiliations:

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Le document en format XML

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Structural behavior of direct-current sputtered and thermally evaporated molybdenum thin films

Structural behavior of direct-current sputtered and thermally evaporated molybdenum thin films

Source :

Abstract

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